Silicon Lithography

Technical Articles

These are articles related to Silicon Lithography. To read an article, click on a link below.

Silicon-Containing Materials For Sub-65 nm Etch (PDF size = 560KB)
The use of silicon-containing materials in future lithography schemes should provide etch-resistant options, while depth of focus and photoresist film thicknesses continue to decrease.

Bilayer Resist for Sub-65 nm Lithography (PDF size = 441KB)
A new class of photoresists with high silicon content (23 wt%) achieved 55 nm features with high etch resistance and low line edge roughness. It also demonstrated compatibility with the immersion lithography process.