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CVD (Chemical Vapor Deposition)


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Chemical Vapor Deposition Tutorial

Overview
Dow Corning’s scientists are the pioneers of silicon-based chemistry and have been involved with the electronics industry since its beginning. Today’s electronics industry has new and unique needs, and our scientists can help you meet the demands of this developing frontier.

Dow Corning has already commercialized a variety of silicon chemical vapor deposition (CVD) precursors for your industry. These precursors are useful in producing silicon, silicon dioxide, silicon carbide and silicon oxycarbide, as well as silicon nitride films. They also provide a number of benefits, such as for processes that require the deposition of thin films at lower temperatures or with high-ĸ and low-ĸ (dielectric constant value) requirements, and filling gaps with high aspect ratios.

We are looking to partner with leaders in wafer processing materials and equipment to commercialize tomorrow’s material solutions. We can provide a smooth transition from lab samples to high-volume production. We will do our best to help advance your technology and enable you to continue your leadership in 45-nm technology and beyond.

CVD Montage

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< CVD (Chemical Vapor Deposition) 홈페이지로 돌아가기  
 
  1. Chemical Vapor Deposition Tutorial


  2. Basics of CVD


  3. CVD Variants


  4. Various Uses of CVD Layers


  5. Benefits of Various Composition Coatings


  6. Precursors Already Commercialized


  7. Drawbacks of Traditional Silicon Source Materials


  8. More Benefits of Working with Dow Corning


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